| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scanning exposure device with a mask stage section capable of scanning in any of X and Y directions in synchronism with a substrate stage so that exposure can be performed, without having to vary the mounting direction of a photosensitive substrate. <P>SOLUTION: The scanning exposure device, with which the pattern of a mask held on the mask stage is transferred under scanning onto a photosensitive substrate held on the substrate stage has a plurality of drive units for carrying out scanning drive of the mask stage and substrate stage in a first direction and a second direction perpendicular to the first stage, a control unit for controlling the plurality of drive units in synchronism with each other, and a switching means for switching the scanning direction. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
