发明名称 ALIGNER AND EXPOSING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an aligner capable of ensuring almost a proper exposure for a plurality of patterns with different pitches formed on a photosensitizer in the state of S polarization. <P>SOLUTION: The aligner forms an image of the patterns on an original plate (M) to be projected onto the photosensitizer (W) by a projection optical system (PL). The aligner is provided with illumination systems (1 to 15) for illuminating the original plate to be projected so that at least parts of the patterns among the patterns on the original plate to be projected are formed on the photosensitizer in a prescribed polarization state, and a luminous quantity control means (20) for controlling the luminous quantity, whereby at least the parts of the patterns reach the image forming region on the photosensitizer, in response to the characteristics of the parts of the patterns. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006005267(A) 申请公布日期 2006.01.05
申请号 JP20040182051 申请日期 2004.06.21
申请人 NIKON CORP 发明人 OKI YASUSHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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