| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus which can prevent contamination due to a quartz component. SOLUTION: The front surfaces of a boat 21, an outer tube 13, an inner tube 12, a base 20a on a seal cap 20, and a heat shielding cap 26 or the like as the quartz components used in a CVD apparatus 10, are previously removed in the length of 1μm or longer with the HF aqueous solution in the concentration of 1 to 50%. A portion of 1μm or more from the front surface of the quartz components is etched. Since impurity of the quartz component in the higher impurity concentration can be removed, contamination due to the quartz compnent can be prevented, and manufacturing yield of the CVD apparatus of the manufacturing method of IC can be improved. COPYRIGHT: (C)2006,JPO&NCIPI |
