| 发明名称 |
SPUTTERING TARGET AND METHOD FOR PREPARATION THEREOF |
| 摘要 |
<p>A sputtering target prepared by the butt joining of metal sheets being made of the same material, wherein an intermetallic compound in a joined portion has an average particle diameter of 60% to 130% of the average particle diameter of the intermetallic compound in a non-joined portion is provided. In the sputtering target, the average particle diameter of an intermetallic compound in a joined portion is approximately the same as that of the intermetallic compound in a non-joined portion.</p> |
| 申请公布号 |
EP1612292(A1) |
申请公布日期 |
2006.01.04 |
| 申请号 |
EP20040722457 |
申请日期 |
2004.03.22 |
| 申请人 |
KOBELCO RESEARCH INSTITUTE, INC. |
发明人 |
MATSUMURA, HIROMI;YONEDA, YOICHIRO |
| 分类号 |
B23K20/22;C23C14/34;(IPC1-7):C23C14/34;B23K20/12 |
主分类号 |
B23K20/22 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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