发明名称 |
Self-draining edge wheel system and method |
摘要 |
<p>Provided is a system and method to prevent the transfer of accumulated fluid to wafers during cleaning operations. Specifically, when a wafer is secured by a plurality of self-draining edge wheels, any fluid contacting the self-draining edge wheels is channeled away from the wafer towards a bottom surface of each of the self-draining edge wheels. The channeling occurs by manufacturing the bottom portions of the self-draining edge wheels to have different configurations. The different configurations enhance fluid channeling away from the wafer. To further prevent fluid from wetting a bottom surface of the self-draining edge wheels, an edge wheel dryer can be positioned proximately adjacent to at least one self-draining edge wheel to suction fluid away from the bottom surface by using a vacuum channel of the edge wheel dryer.</p> |
申请公布号 |
EP1612844(A1) |
申请公布日期 |
2006.01.04 |
申请号 |
EP20050253789 |
申请日期 |
2005.06.17 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
GARCIA, JAMES P.;REDEKER, FRITZ |
分类号 |
H01L21/00;B08B3/00;B08B3/04 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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