发明名称 Positioning apparatus and photolithography apparatus including the same
摘要 <p>A positioning apparatus comprises a first stage (2), a second stage (1) movable relative to the first stage, a pair of first light reflectors (6a,6b) disposed on the first stage (2), the first light reflectors positioned at an acute angle with respect to a vertical axis of the apparatus, a pair of second light reflectors (7a,7b) disposed on the second stage (1), the second light reflectors positioned orthogonal to the vertical axis, a reference structure (4) facilitating measurement of a vertical position of the second stage (1), a pair of third light reflectors (8a,8b) disposed on the reference structure (4), the third light reflectors positioned orthogonal to the vertical axis, and a pair of interferometers (9a,9b) configured to measure the vertical position of the second stage (1) using light reflected, in use, from the first, second, and third light reflectors.</p>
申请公布号 EP1612608(A2) 申请公布日期 2006.01.04
申请号 EP20050254122 申请日期 2005.06.30
申请人 CANON KABUSHIKI KAISHA 发明人 TANAKA, HIDEO
分类号 G03F7/20;H01L21/68 主分类号 G03F7/20
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