Volatile copper aminoalkoxide complex and deposition of copper thin film using same

摘要

A volatile copper aminoalkoxide complex of formula (I) can form a copper thin film having an improved quality by metal organic chemical vapor deposition (MOCVD): wherein, R¹, R², R³ and R⁴ are each independently C_1-4 alkyl optionally carrying one or more fluorine substituents; and m is an integer in the range of 1 to 3.