发明名称 NANOWIRE SEMICONDUCTOR DEVICE
摘要 <p>Semiconductor devices are fabricated using nanowires (16). A conductive gate (22) may be used to control conduction along the nanowires (16), in which case one of the contacts is a drain (12) and the other a source (18). The nanowires (16) may be grown in a trench or through-hole (8) in a substrate (2) or in particular in epilayer (3) on substrate (2). The gate (22) may be provided only at one end of the nanowires (16). The nanowires (16) can be of the same material along their length; alternatively different materials can be used, especially different materials adjacent to the gate (22) and between the gate (22) and the base of the trench.</p>
申请公布号 WO2005124872(A1) 申请公布日期 2005.12.29
申请号 WO2005IB51843 申请日期 2005.06.07
申请人 KONINKLIJKE PHILIPS ELECTRONICS N.V.;HIJZEN, ERWIN, A.;BAKKERS, ERIK, P., A., M.;HUETING, RAYMOND, J., E.;BALKENENDE, ABRAHAM, R. 发明人 HIJZEN, ERWIN, A.;BAKKERS, ERIK, P., A., M.;HUETING, RAYMOND, J., E.;BALKENENDE, ABRAHAM, R.
分类号 H01L21/20;H01L21/336;H01L29/06;H01L29/267;H01L29/775;H01L29/786;H01L29/861;H01L29/872;H01L51/00;H01L51/05;(IPC1-7):H01L29/775 主分类号 H01L21/20
代理机构 代理人
主权项
地址