Telecenter determination device for microlithography-projection illumination system, has processor unit for determining telecenter error value from wave front tip measuring value that is attained by wave front measuring device

摘要

The device has wave front measuring device with measuring reticle, measuring unit and lighting lens for determining wave front tips in measuring points that are shifted against each other in several non- parallel transverse direction perpendicular to an optical axis of an optical imaging system. A processor unit (5) determines a telecenter error value from a wave front tip measuring value attained by the wave front measuring device. Independent claims are also included for the following: (A) a method for telecenter determination at an optical imaging system (B) a microlithography-projection illumination system with a device for telecenter determination at an optical imaging system.