发明名称 VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY
摘要 A vacuum system for extracting a stream of a multi-phase fluid from a photo­lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank (32) located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump (36) for extracting gas from the tank, and a second pump (38) for extracting liquid from the tank (32). In order to minimise any pressure fluctuations transmitted from the vacuum system back to the fluid (32) within the tool, a pressure control system maintains a substantially constant pressure in the tank (32) by regulating the amounts of liquid and gas within the tank (32).
申请公布号 WO2005124464(A2) 申请公布日期 2005.12.29
申请号 WO2005GB02205 申请日期 2005.06.06
申请人 THE BOC GROUP PLC;HARPHAM, ANDREW, JOHN;SHECHTER, PAUL, JOHN;STOCKMAN, PAUL, ALAN 发明人 HARPHAM, ANDREW, JOHN;SHECHTER, PAUL, JOHN;STOCKMAN, PAUL, ALAN
分类号 B01D57/00;G03F7/20 主分类号 B01D57/00
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