LOAD PORT

摘要

A load port (100) has a placement table (101) on which a wafer carrier (10) is placed, a nozzle section (110) having a nozzle opening (111) for causing a purge gas that replaces an atmosphere in the wafer carrier (10) to flow out and/or flow in parallel to a gap (A) between wafers (1) in the wafer carrier (10), a drive section including a nozzle-driving motor (166) etc. for advancing the nozzle section (110) to a door opening section (202) of the load port (100), the door opening section (202) being formed in the vicinity of a wall surface (201) of a clean room inside which a wafer-processing device is provided, a sealed space-forming section (120) for forming a sealed space (B) airtightly connected to a container opening section (12) and continuous to an inner space of the wafer carrier (10), a control section (160) for switching and controlling the flow of the purge gas in the nozzle section (110) according to oxygen concentration indicating the degree of purging of the atmosphere in the wafer carrier (10), and other sections.