发明名称 |
EVACUATION APPARATUS |
摘要 |
The present invention relates to an evacuation apparatus for evacuating a vacuum chamber of a substrate processing apparatus for processing a substrate such as a semiconductor wafer or liquid crystal panel. An evacuation apparatus according to the present invention includes a first vacuum pump connected to a vacuum chamber, and a second vacuum pump connected to the first vacuum pump. The first vacuum pump has a pair of multistage pump rotors. |
申请公布号 |
WO2005038255(B1) |
申请公布日期 |
2005.12.29 |
申请号 |
WO2004JP15563 |
申请日期 |
2004.10.14 |
申请人 |
EBARA CORPORATION;KAWAMURA, TAKESHI;KAGAWA, KOICHI |
发明人 |
KAWAMURA, TAKESHI;KAGAWA, KOICHI |
分类号 |
C23C16/44;F04B49/06;F04C18/00;F04C18/12;F04C18/16;F04C21/00;F04C23/00;F04C25/02;F04C28/02;F04C28/08;F04C29/00 |
主分类号 |
C23C16/44 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|