| 摘要 |
A method of manufacturing a thin film transistor array panel includes: forming a gate line on a substrate; forming a gate insulating layer on the gate line; forming a data line and a drain electrode on the gate insulating layer; depositing an organic semiconductor layer on the data line, the drain electrode and exposed portions of the gate insulating layer; depositing a protection layer on the organic semiconductor layer; forming a photoresist on the protection layer, the photoresist having positive photosensitivity; etching the protection layer and the organic semiconductor layer using the photoresist as an etch mask; forming a passivation layer on the protection layer, the data line, and the drain electrode, the passivation layer having a contact hole exposing a portion of the drain electrode; and forming a pixel electrode on the passivation layer, the pixel electrode electrically connected to the drain electrode via the contact hole. |
