| 摘要 |
<p>An electron beam drawing device capable of easily regulating a beam and a rotation center without increasing the size of the device, the device comprising a unit for emitting an electron beam, a rotary stage for rotatably supporting a turn-table holding an object of drawing, and a sample table being supported by the turn-table within a range including the rotation center of the turn-table and holding a regulating sample. When an electron beam is applied to an object of drawing during the rotation of a turn-table, a rotation-symmetric (such as concentric, radial) pattern can be drawn on the object of drawing. When a beam and a rotation center are regulated by using a regulating sample before actually drawing a pattern on an object of drawing, a regulating sample is held by a sample table and the sample table is supported by the turn-table within a range including the rotation center of the turn-table. Therefore, a beam and a rotation center can be regulated using a regulating sample supported on the turn-table to eliminate the need of a separate regulating sample-mounting stage, whereby the device can be downsized.</p> |
