COMPOUND, POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

Disclosed is a positive resist composition with excellent resolution which enables to form a good resist pattern even when there is used an acid generator which generates a weak acid. Such a positive resist composition contains a polymer compound having a constitutional unit (a1) represented by the general formula (II) below and an acid generator component (B) which generates an acid when exposed to light. (II) [In the formula, R<1> represents a hydrogen atom or a lower alkyl group; R<3> represents an alkyl group having 1-15 carbon atoms or an alicyclic group, and may have one or more substituents selected from the group consisting of ether bonds, hydroxyl group, carbonyl groups, ester groups and amino group; and n2 represents 0 or an integer of 1-3.]