发明名称 Lithographic apparatus and patterning device transport
摘要 According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.
申请公布号 US2005286029(A1) 申请公布日期 2005.12.29
申请号 US20040972755 申请日期 2004.10.26
申请人 ASML NETHERLANDS B.V. 发明人 HAM ERIK L.;HEERENS GERT-JAN;LANSBERGEN ROBERT G.M.;MEIJER ELLARD A.;MEIJER HENDRICUS J.M.;MEILING HANS;MERTENS BASTIAAN M.;MOORS JOHANNES H.J.
分类号 G03B27/52;G03B27/62;(IPC1-7):G03B27/52 主分类号 G03B27/52
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