Single wafer type cleaning method and apparatus,申请号SG20010005536-传众专利搜索

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发明名称	Single wafer type cleaning method and apparatus
摘要
申请公布号	SG117396(A1)	申请公布日期	2005.12.29
申请号	SG20010005536	申请日期	2001.09.11
申请人	S.E.S. COMPANY LIMITED	发明人	YUJI ONO;RYOICHI OHKURA
分类号	H01L21/306;H01L21/00;H01L21/304;(IPC1-7):B08B3/02	主分类号	H01L21/306
代理机构		代理人
主权项
地址

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