Cathode arrangement for a sputtering device in glass coating installations comprises a support structure having a target material on its surface for forming a tubular target with a cross-section

摘要

Cathode arrangement comprises a support structure having a target material on its surface for forming a tubular target with a cross-section of at least 250 mm. Independent claims are also included for the following: (1) Coating compartment with the above cathode arrangement for a sputtering device; and (2) Coating installation for coating glass substrates with the coating compartment.