发明名称 Process for producing a web of a semiconductor material
摘要 Process for producing a web of a semiconductor material The invention relates to a process for producing two webs of a semiconductor material, in which a sacrificial web of a first material is produced on a semiconductor substrate, in which the first material is selected in such a way that the crystal structure of the semiconductor substrate is substantially transferred to the sacrificial web, in which the two webs of a semiconductor material are deposited on two opposite side walls of the sacrificial web, in which the crystal structure of the sacrificial web is substantially transferred to the crystal structure of the webs, and in which the sacrificial webs are then removed.
申请公布号 US2005287772(A1) 申请公布日期 2005.12.29
申请号 US20050145174 申请日期 2005.06.06
申请人 INFINEON TECHNOLOGIES AG 发明人 SCHLOSSER TILL;NUTZEL JOACHIM
分类号 H01L21/20;H01L21/336;H01L21/36;H01L29/786;H01L31/20;(IPC1-7):H01L21/20 主分类号 H01L21/20
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