发明名称 |
EQUIPMENT AND METHOD FOR ELECTROLYTIC DEPOSITION TREATMENT |
摘要 |
<p>Electrolytic deposition treatment equipment and method which can reduce metallic ion concentration of a treated liquid by electrolytic deposition to a level where the treated liquid can be discharged outside and can perform such treatment even when a quantity of wastewater generated by semiconductor manufacturing equipment is large. The electrolytic deposition treatment equipment is provided with a cathode (3) for depositing the metallic ion in water being treated as metal, a cation exchange film (4) arranged to face the cathode (3), and an anode (6) arranged to face the cation exchange film (4) through a cation exchange body (5). The water to be treated is supplied in a space between the cathode (3) and the cation exchange film (4).</p> |
申请公布号 |
WO2005123605(A1) |
申请公布日期 |
2005.12.29 |
申请号 |
WO2005JP11483 |
申请日期 |
2005.06.16 |
申请人 |
EBARA CORPORATION;AKAHORI, MASAJI;NAKAGAWA, SOTA;HORIE, TAKUO |
发明人 |
AKAHORI, MASAJI;NAKAGAWA, SOTA;HORIE, TAKUO |
分类号 |
B01D63/16;B01D61/44;B01D61/46;C02F1/461;C25C1/12;C25C7/02;C25C7/04;C25C7/08;(IPC1-7):C02F1/461 |
主分类号 |
B01D63/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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