DEVICE FOR THE TREATMENT OF A SUBSTRATE BY MEANS OF AT LEAST ONE PLASMA JET

摘要

The invention relates to a device (10) for treating a substrate (11) with the aid of at least one plasma jet (13). Said device comprises a receptacle (15) through which a carrier gas flows along a certain direction of flow (x), a first electrode (17), and a second electrode (18). The inventive device is characterized in that the two electrodes (17, 18) are separated from each other by means of at least one dielectric barrier (15) while an alternating voltage is applied between the electrodes (17, 18) in order to create an atmospheric pressure glow discharge plasma. Furthermore, the first electrode (17) is axially (L) and radially (R) spaced apart from the second electrode (18) relative to the direction of flow (x) of the carrier gas.