发明名称 |
MODIFIED POLYMERS AND THEIR USE IN THE PRODUCTION OF LITHOGRAPHIC PRINTING PLATE PRECURSORS |
摘要 |
<p>Radiation-sensitive negative working element comprising (a) a substrate with a hydrophilic surface and (b) a layer on the hydrophilic surface of the substrate, wherein said layer comprises a modified polymer obtainable by reacting (i) a polymer with -COOH, -SO3H, -P03H2 and/or -PO4H2 in the side chains, wherein the polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, and (ii) a salt with an inorganic or organic cation, wherein the modified polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, said layer being soluble in aqueous alkaline developer, but is rendered insoluble in aqueous alkaline developer by IR radiation.</p> |
申请公布号 |
WO2005123412(A1) |
申请公布日期 |
2005.12.29 |
申请号 |
WO2005EP06426 |
申请日期 |
2005.06.15 |
申请人 |
KODAK POLYCHROME GRAPHICS GMBH;SAVARIAR-HAUCK, CELIN;MONK, ALAN, S., V.;ULLRICH, RENE |
发明人 |
SAVARIAR-HAUCK, CELIN;MONK, ALAN, S., V.;ULLRICH, RENE |
分类号 |
B41C1/10;B41M5/36;(IPC1-7):B41M5/36 |
主分类号 |
B41C1/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|