发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
<p>A lithographic projection apparatus is disclosed. The apparatus includes an illumination system (IL) configured to condition a beam of radiation (PB), and a support structure (MT) configured to support a patterning device (MA). The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table (WT) configured to hold a substrate (W), a projection system (PL) configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system (10) configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device (12,14,16,18) configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.</p> |
申请公布号 |
EP1610183(A2) |
申请公布日期 |
2005.12.28 |
申请号 |
EP20050076479 |
申请日期 |
2005.06.23 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOF, JOERI;MULKENS, JOHANNES C. H.;MERTENS, JEROEN J. S. M.;VAN DER NET, ANTONIUS J.;VAN DER HAM, RONALD;LALLEMANT, NICHOLAS A.;BECKERS, MARCEL |
分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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