发明名称 Composition and method using same for removing residue from a substrate
摘要 A composition for removing residues and method using same are described herein. In one aspect, the composition comprises: an organic polar solvent; water; a quaternary ammonium compound; and a mercapto-containing corrosion inhibitor selected from a compound having the following formulas (I), (II), 2-mercaptothiazoline, 3-mercaptopropyl-trimethoxysilane, and mixtures thereof: wherein X, Y, and Z are each independently selected from C, N, O, S, and P; R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 are each independently an alkyl group having a formula C n H 2n+1 ; R 7 is one selected from H, -OH, -COOH, and -NH 2 ; and R 8 is selected from an alkyl group having a formula C n H 2n+1 , or an alkanol group having a formula C n H 2n OH; n ranges from 0 to 20; and the composition is substantially free of a water soluble amine. In another aspect, the composition comprises hydroxylamine wherein the mass ratio of hydroxylamine to quarternary ammonium compound is less than 3.
申请公布号 EP1610185(A2) 申请公布日期 2005.12.28
申请号 EP20050012644 申请日期 2005.06.13
申请人 AIR PRODUCTS AND CHEMICALS, INC. 发明人 HSU, JIUN YI;WU, AIPING;EGBE, MATTHEW I.
分类号 G03F7/42;C23F11/14;C23F11/16;G03F7/32 主分类号 G03F7/42
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