发明名称 Coating device and method by cathodic sputtering
摘要 <p>Device for coating a substrate (1) using cathodic sputtering comprises a filtering arrangement (10) having a magnetic guiding component (11). The filtering arrangement is structured and arranged so that the sputtered ionized target material (622) is fed to the surface of the substrate through the magnetic component and the sputtered non-ionized target material is filtered through the filtering arrangement before reaching the surface of the substrate. An independent claim is also included for: a method for coating a substrate using the above device.</p>
申请公布号 EP1609882(A1) 申请公布日期 2005.12.28
申请号 EP20040405394 申请日期 2004.06.24
申请人 METAPLAS IONON OBERFLAECHENVEREDELUNGSTECHNIK GMBH 发明人 VETTER, JOERG
分类号 C23C14/35;H01J37/34;(IPC1-7):C23C14/35 主分类号 C23C14/35
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