发明名称 Semiconductor transistor having structural elements of differing materials and method of formation
摘要 A transistor is formed using a semiconductor substrate and forming a control electrode overlying the semiconductor substrate. A first current electrode is formed within the semiconductor substrate and adjacent the control electrode. The first current electrode has a first predetermined semiconductor material. A second current electrode is formed within the semiconductor substrate and adjacent the control electrode to form a channel within the semiconductor substrate. The second current electrode has a second predetermined semiconductor material that is different from the first predetermined semiconductor material. The first predetermined semiconductor material is chosen to optimize bandgap energy of the first current electrode, and the second predetermined semiconductor material is chosen to optimize strain of the channel.
申请公布号 US6979622(B1) 申请公布日期 2005.12.27
申请号 US20040924632 申请日期 2004.08.24
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 THEAN VOON-YEW;TRIYOSO DINA H.;NGUYEN BICH-YEN
分类号 H01L21/336;H01L21/8238;H01L21/84;H01L29/165;H01L29/51;(IPC1-7):H01L21/366 主分类号 H01L21/336
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