发明名称 |
VAPOR DEPOSITION APPARATUS |
摘要 |
An apparatus (10) for decomposing and depositing gaseous metal carbonyls on a mandrel (36). A base plate (12) and cover (14) define a inaction chamber (20). A mandrel ring (28), nested within the base plate (12) and insulated therefrom, supports the mandrel (36). Heat transfer fluid flows through the mandrel ring (28) and into the mandrel (36) to maintain the mandrel (36) at a predetermined temperature to initiate thermal decomposition.
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申请公布号 |
CA2276000(C) |
申请公布日期 |
2005.12.27 |
申请号 |
CA19982276000 |
申请日期 |
1998.05.11 |
申请人 |
INCO LIMITED |
发明人 |
PASSMORE, IAN KEITH;TYROLER, GEORGE PAUL;ALBERTY, MICHAEL RYAN;WEBER, REINHART |
分类号 |
C23C16/01;C23C16/16;C23C16/44;C23C16/458;C23C16/46;(IPC1-7):C23C16/16 |
主分类号 |
C23C16/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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