发明名称 VAPOR DEPOSITION APPARATUS
摘要 An apparatus (10) for decomposing and depositing gaseous metal carbonyls on a mandrel (36). A base plate (12) and cover (14) define a inaction chamber (20). A mandrel ring (28), nested within the base plate (12) and insulated therefrom, supports the mandrel (36). Heat transfer fluid flows through the mandrel ring (28) and into the mandrel (36) to maintain the mandrel (36) at a predetermined temperature to initiate thermal decomposition.
申请公布号 CA2276000(C) 申请公布日期 2005.12.27
申请号 CA19982276000 申请日期 1998.05.11
申请人 INCO LIMITED 发明人 PASSMORE, IAN KEITH;TYROLER, GEORGE PAUL;ALBERTY, MICHAEL RYAN;WEBER, REINHART
分类号 C23C16/01;C23C16/16;C23C16/44;C23C16/458;C23C16/46;(IPC1-7):C23C16/16 主分类号 C23C16/01
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