发明名称 PLASMA PROCESSING CONTROL
摘要 A plasma processing control and apparatus uses Magnetic Resonance techniques (including nuclear magnetic resonance and / or electron paramagnetic techniques ) to characterize the process chamber, the plasma sources and/or workpieces inside. This method is suitable for plasma sterilization where microbial life must be destroyed or material processing to integrate the process and the inspection in only one equipment for optimal productivity.
申请公布号 WO2005122209(A2) 申请公布日期 2005.12.22
申请号 WO2005IB51788 申请日期 2005.06.01
申请人 HELYSSEN SARL;GUITTIENNE, PHILIPPE 发明人 GUITTIENNE, PHILIPPE
分类号 H01J37/32 主分类号 H01J37/32
代理机构 代理人
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