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发明名称
PHOTO-SENSITIVE DISSOLUTION INHIBITOR IMPROVING POST EXPOSURE BAKE SENSITIVITY OF LINE-WIDTH OF PHOTORESIST PATTERN AND CHEMICALLY-AMPLIFIED PHOTORESIST COMPOSITION INCLUDING THE SAME
摘要
申请公布号
KR20050120358(A)
申请公布日期
2005.12.22
申请号
KR20040045677
申请日期
2004.06.18
申请人
DONGJIN SEMICHEM CO., LTD.
发明人
OH, SEUNG KEUN;KIM, JUNG WOO;LEE, JAE WOO;KIM, JAE HYUN
分类号
G03F7/004;G03F7/039;(IPC1-7):G03F7/004
主分类号
G03F7/004
代理机构
代理人
主权项
地址
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