| 摘要 |
<P>PROBLEM TO BE SOLVED: To enhance measuring precision of a shearing interferometer, in the shearing interferometer, a measuring method by the shearing interferometer, a method of manufacturing a projection optical system, the projection optical system, and an exposure device. <P>SOLUTION: In this shearing interferometer for measuring an inspected face of a specimen, by irradiating a pinhole with a light beam emitted from a light source to irradiate the specimen with the light beam via the pinhole, and by irradiating thereafter a mask provided with a plurality of holes for selecting diffraction light to measure a shearing interference fringe formed by the diffraction light selected by the mask, zero-order light and +primary light are selected out of the diffraction lights formed by a diffraction element to be measured, then zero-order light and -primary light are measured further out of the diffraction lights formed by the diffraction element, and calibration is carried out on the basis of respective measured results therein. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
