| 摘要 |
An exposure apparatus that irradiates an energy beam to a substrate includes a projection optical system that projects the energy beam to the substrate, and a support device having a flexible structure to support the projection optical system. According to one embodiment, the flexible structure includes three flexible rods that support the projection optical system from an upper side of the projection optical system. According to an embodiment, extended lines of the respective rods cross at a reference point of the projection optical system.
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