FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION

摘要

A fluorine-atom-containing polymerizable unsaturated-monomer of the present invention is represented by the following formula (1a) or (1b): wherein each of a ring Z¹ and a ring Z² is an alicyclic carbon ring; when the alicyclic carbon ring is multi-cyclic, a part of atoms constituting the ring may be substituted by an oxygen atom, a sulfur atom or a nitrogen atom; an atom constituting the ring Z¹ and the ring Z² may have a substituent; each of R¹, R² and R³ is an alkyl group or a fluoroalkyl group; R is an specific unsaturated acyl group; provided that at least one of R¹ and R² is a fluorine atom or a fluoroalkyl group in the formula (1a), and in the formula (1b) (i) the ring Z² is bonded by a fluorine atom or a fluoroalkyl group, or (ii) R³ is a fluoroalkyl group.