发明名称 |
Wet cleaning apparatus including a cover for removing impurities thereon |
摘要 |
An apparatus is provided for performing a wet process to a substrate. The apparatus comprises a bath, having a top portion which defines an opening, for storing a liquid for wet processing the substrate. A cover is also provided which is movably connected to the bath at the top portion thereof. The cover includes a first face facing the opening of the bath and a second face facing away from the opening of the bath. The second face has a plurality of holes therewithin. It also contains a portion interposed between the first and second faces in communication with the holes for containing a cleaning solution. The cleaning solution is discharged through the holes from the containing portion and flows on the second face for removing any impurities from the second face.
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申请公布号 |
US2005279389(A1) |
申请公布日期 |
2005.12.22 |
申请号 |
US20050144220 |
申请日期 |
2005.06.02 |
申请人 |
JUN YONG-MYUNG;HONG JIN-SUK;CHU KI-YEON |
发明人 |
JUN YONG-MYUNG;HONG JIN-SUK;CHU KI-YEON |
分类号 |
H01L21/304;B08B3/04;B08B17/06;H01L21/00;(IPC1-7):B08B3/04 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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