发明名称 |
ATMOSPHERIC PRESSURE CVD SYSTEM AND METHOD FOR CLEANING GAS BLOW-OFF PORT OF THE SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To provide an atmospheric pressure CVD system which gasifies and removes deposits such as SiO<SB>2</SB>stuck to the gas blow-off port of a gaseous material by blowing off cleaning gas thereto. SOLUTION: The atmospheric pressure CVD system 1 has a unit 20 for supplying a gaseous material and is an apparatus for supplying the gaseous material and forming a thin film on the surface of an object to be treated by a vapor phase reaction. The apparatus comprises a heater unit 10 for heating an object to be heated, and a cleaning unit 30 for blowing off the cleaning gas 38 which is made into a plasma and removes the deposits such as the SiO<SB>2</SB>stuck to a gas diffuser 22 of a gaseous material supply unit 20 as the gas blow-off port. The cleaning unit 30 is equipped with electrodes 32 and 33 facing each other apart a spacing and discharges electricity under nearly the atmospheric pressure by applying a voltage between the electrodes from a power source 34 to make the cleaning gas into the plasma through the discharge space 36. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2005350762(A) |
申请公布日期 |
2005.12.22 |
申请号 |
JP20040213475 |
申请日期 |
2004.07.21 |
申请人 |
SEKISUI CHEM CO LTD |
发明人 |
ITO TAKUMI;NAKANO YOSHINORI |
分类号 |
C23C16/44;H01L21/205;(IPC1-7):C23C16/44 |
主分类号 |
C23C16/44 |
代理机构 |
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