发明名称 SEMICONDUCTOR SUBSTRATE, AND THINNING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor substrate reliably protected from wafer cracks in the wafer thinning process, and to provide a thinning method for the semiconductor substrate. SOLUTION: An element region 11 with a semiconductor element formed thereon and a substrate peripheral region 10b different from the element region 11 are provided on the surface of a semiconductor 10. A rugged section 12 is formed on the substrate peripheral region 10b. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005353730(A) 申请公布日期 2005.12.22
申请号 JP20040171024 申请日期 2004.06.09
申请人 SEIKO EPSON CORP 发明人 YAMAGUCHI KOJI
分类号 C23C30/00;H01L21/02;H01L21/304;H01L21/306;H01L21/48;H01L21/68;H01L23/48;(IPC1-7):H01L21/02 主分类号 C23C30/00
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