发明名称 Substrate processing apparatus
摘要 An object of the present invention is to improve the operation efficiency of a substrate processing apparatus while ensuring the safety of an operator who performs maintenance of the apparatus. The present invention is a substrate processing apparatus including a substrate unit capable of housing a substrate and a substrate carrier unit for carrying the substrate to the substrate unit, in a casing, including: an outer wall panel detachably attached to the casing at a position opposed to the substrate unit; a shut-off mechanism capable of shutting a first space within which the substrate unit is located off from a second space other than the first space within which the substrate carrier unit is located, in the casing, the first space being opened to the outside of the casing by detaching the outer wall panel; a shut-off mechanism operating member for operating the shut-off mechanism to shut the first space off from the second space; and an interlock mechanism for stopping motion of the whole in the casing when the outer wall panel is detached. The apparatus has an interlock disabling mechanism for disabling the interlock mechanism when the shut-off mechanism shuts the first space off from the second space.
申请公布号 US2005279281(A1) 申请公布日期 2005.12.22
申请号 US20050152210 申请日期 2005.06.15
申请人 TOKYO ELECTRON LIMITED 发明人 YAMASHITA MASAMI;NAKASHIMA SEIJI
分类号 C23C16/00;C23F1/00;H01L21/00;(IPC1-7):C23C16/00 主分类号 C23C16/00
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