| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma X-ray generating system wherein damage on the optical system and the absorption loss of the generated X-rays are suppressed. <P>SOLUTION: The plasma X-ray generating system comprises a vacuum container 11; a plasma X-ray source 13 installed in the vacuum container 11 for converting an operative G, supplied to a plasma producing section 17 formed in between plasma producing discharge electrodes 15 and 16, into plasma for generating X-rays; exhausting means 12 for exhausting residual plasma D after the passage of the effective luminous time in the plasma producing section 17; and a low-voltage electrode formed away from the plasma forming discharge electrode 15 and lower in potential than the plasma producing discharge electrode 15, with the electrostatic force of the low-voltage electrode accelerating the rate of exhaustion of the residual plasma D. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
