| 摘要 |
PROBLEM TO BE SOLVED: To perform the processing of a substrate by different kinds of processing liquids in a single processing vessel, by preventing the vapors volatilized from the processing liquids from affecting adversely the processings of the substrate which are performed in other processing portions. SOLUTION: In the main body 11 of a substrate processor 10, while carrying a substrate B by carrying rollers 17 in a substantially horizontal direction, the substrate B is subjected successively to each etching processing and to each cleaning processing following each etching processing. In this substrate processor 10, there are provided constitutively a plurality of liquid recovering type nozzle devices 20, filter devices 70, and exhausting pipes 19. Each liquid recovering type nozzle device 20 is so disposed along a carrying path 171 present in the processor main body 11 that it has a very small clearance oppositely to the processed surface of the carried substrate B. Each filter device 70 is so provided correspondingly to each liquid recovering type nozzle device 20 as to introduce a clean air into the processor main body 11 via each filter 71. Each exhausting pipe 19 exhausts the introduced clean air to the outside of the processor main body 11. COPYRIGHT: (C)2006,JPO&NCIPI
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