发明名称 Solid electrolyte memory cell production method for semiconductor memories involves doping solid electrolyte material with dopant and then irradiating cell with suitable ions or ion beam either partly or completely
摘要 <p>The method involves production of a solid electrolyte memory cell which has a memory section. The cell has a solid electrolyte material area (11) made up of a solid electrolyte material (11'). The area is activated by doping it with a dopant (12) and then the cell is irradiated with ions or ion beam (30) either partly or completely.</p>
申请公布号 DE102004026111(A1) 申请公布日期 2005.12.22
申请号 DE20041026111 申请日期 2004.05.28
申请人 INFINEON TECHNOLOGIES AG 发明人 HAPP, THOMAS;PINNOW, CAY-UWE
分类号 G11C13/00;H01L21/8239;H01L27/24;H01L45/00;(IPC1-7):H01L27/24;H01L21/823 主分类号 G11C13/00
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