发明名称 |
Solid electrolyte memory cell production method for semiconductor memories involves doping solid electrolyte material with dopant and then irradiating cell with suitable ions or ion beam either partly or completely |
摘要 |
<p>The method involves production of a solid electrolyte memory cell which has a memory section. The cell has a solid electrolyte material area (11) made up of a solid electrolyte material (11'). The area is activated by doping it with a dopant (12) and then the cell is irradiated with ions or ion beam (30) either partly or completely.</p> |
申请公布号 |
DE102004026111(A1) |
申请公布日期 |
2005.12.22 |
申请号 |
DE20041026111 |
申请日期 |
2004.05.28 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
HAPP, THOMAS;PINNOW, CAY-UWE |
分类号 |
G11C13/00;H01L21/8239;H01L27/24;H01L45/00;(IPC1-7):H01L27/24;H01L21/823 |
主分类号 |
G11C13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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