POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING PATTERN USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition having high sensitivity and high resolution and satisfying both of a preferable pattern feature and preferable PED (post exposure delay) characteristics in vacuum, and to provide a method for forming a pattern by using the composition.

SOLUTION: The positive resist composition contains: (A) a resin which is insoluble or hardly insoluble with an alkali aqueous solution and is changed into soluble with an alkali aqueous solution by the effect of an acid; (B) a compound which generates an acid by irradiation with actinic rays or radiation; and (C) an organic basic compound. The composition contains a resin (A1) having a repeating unit of the structure expressed by general formula (1) and another resin (A2) as the resins of the component (A). The method for forming a pattern is carried out by using the above composition.

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