| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of performing exposure in even radiation in a lithographic device using a programmable array. <P>SOLUTION: If a pattern forming beam of radiation where a pattern is formed by using individually controllable elements is projected onto the target portion of a substrate, (a) each pixel controls elements as usual so as to send the radiation not exceeding a predetermined standard maximum radiation to the targeted portion in an exposure step, and (b) at least one selected pixel exceptionally controls the elements so as to send an increased radiation more than the standard maximum radiation. The increased radiation is sent so as to compensate an effect that affects a pixel adjacent to the pixel where a defective element is selected at the existing position of an array. Further, the pixel that is affected by the existing defective element compensates the shortage of exposure on the targeted portion at the position of the selected pixel generated by an exposure at the position. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
