| 摘要 |
<P>PROBLEM TO BE SOLVED: To enable a measurement of illuminance unevenness at optional timing except exposing time. <P>SOLUTION: A scanning aligner comprises a projecting optical system projecting a pattern on an original plate to substrate top surface, an illuminating optical system illuminating the original plate by converting a light from a light source into a flux of light of designated illumination distribution, and a scanning means for transferring the original plate and the substrate in single dimension by synchronizing them with respect to the above-mentioned projecting optical system. In a scanning type projecting optical device exposing the pattern on original plate surface to the substrate with a scanning exposing system, the device has an illumination measuring system for measuring an illuminance of the above-mentioned flux, and a transferring means for transferring at least one portion of the illumination measuring system inside the above-mentioned flux in the above-mentioned illuminating optical system or the above-mentioned projecting optical system. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
