发明名称 Transistor with vertical dielectric structure
摘要 A transistor ( 103 ) with a vertical structure ( 113 ) that includes a dielectric structure ( 201 ) below a semiconductor structure ( 109 ). The semiconductor structure includes a channel region ( 731 ) and source/drain regions ( 707, 709 ). The transistor includes a gate structure ( 705, 703 ) that has a portion laterally adjacent to the semiconductor structure and a portion laterally adjacent to the dielectric structure. In one embodiment, the gate structure is a floating gate structure wherein a control gate structure ( 719 ) also includes portion laterally adjacent to the dielectric structure and a portion laterally adjacent to the semiconductor structure. In some examples, having a portion of the floating gate and a portion of the control gate adjacent to the dielectric structure acts to increase the control gate to floating gate capacitance without significantly increasing the capacitance of the floating gate to channel region.
申请公布号 US2005282345(A1) 申请公布日期 2005.12.22
申请号 US20040871772 申请日期 2004.06.18
申请人 MATHEW LEO;MURALIDHAR RAMACHANDRAN 发明人 MATHEW LEO;MURALIDHAR RAMACHANDRAN
分类号 H01L21/28;H01L21/336;H01L29/423;H01L29/786;H01L29/788;(IPC1-7):H01L21/336 主分类号 H01L21/28
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