| 摘要 |
PROBLEM TO BE SOLVED: To adequately form a lattice pattern on a substrate. SOLUTION: This apparatus for forming the pattern is provided with: a stage moving mechanism for moving the substrate 9 in an X direction on which a plurality of first linear pattern elements 91 are formed beforehand in a Y direction; a discharge part for discharging a pattern forming material from a discharge port 541 toward the substrate 9; and a light emitting part 53 for emitting ultraviolet rays toward the substrate 9. A second pattern element 92 is hardened by irradiating an uncrossed part 922 of the second pattern element 92, which is formed by discharging the pattern forming material while moving the substrate 9, with ultraviolet rays emitted from the side of the undersurface of the substrate 9 through the gaps of the plurality of first pattern elements 91. As a result, a crossed part 921 is slowly hardened and adapted to each of first pattern elements 91 and the uncrossed part 922 is hardened quickly to prevent the second pattern element 92 from being out of shape, so that the lattice pattern can be adequately formed on the substrate 9. COPYRIGHT: (C)2006,JPO&NCIPI
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