发明名称
摘要 A high-strength Cu based alloy, consists essentially of: Ni: 0.5 to 2.0 %; Sn: 1.2 to 2.5 %; Si: 0.04 to 0.1 %; Zn: 0.1 to 1 %; Mg: 0.0001 to 0.02 %; Mn: 0.0001 to 0.1 %; P: 0.0001 to 0.02 %; and Cu and inevitable impurities: the balance, wherein the total content of Mg, Mn and P is 0.001 to 0.12 %. The Cu based alloy is suitable for use as a material of electrical and electronic parts, and free from smutting during pretreatment for plating thereof.
申请公布号 JP3728776(B2) 申请公布日期 2005.12.21
申请号 JP19950225730 申请日期 1995.08.10
申请人 发明人
分类号 C22C9/02;C22C9/06;H01L23/48;(IPC1-7):C22C9/02 主分类号 C22C9/02
代理机构 代理人
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