COMPONENTS PERIPHERAL TO THE PEDESTAL IN THE GAS FLOW PATH WITHIN A CHEMICAL VAPOR DEPOSITION CHAMBER,申请号KR19970032160-传众专利搜索

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发明名称	COMPONENTS PERIPHERAL TO THE PEDESTAL IN THE GAS FLOW PATH WITHIN A CHEMICAL VAPOR DEPOSITION CHAMBER
摘要
申请公布号	KR100522903(B1)	申请公布日期	2005.12.21
申请号	KR19970032160	申请日期	1997.07.11
申请人		发明人
分类号	C23C16/44;(IPC1-7):C23C16/44	主分类号	C23C16/44
代理机构		代理人
主权项
地址

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