| 摘要 |
An electron beam lithography system includes a main chamber (4) and the exchange chamber (5) connected by a gate valve (7). A robot (15) is used to transfer a chuck (8) carrying a semiconductor wafer between a cassette (10) and laser interferometer mirror assembly (13). The robot includes a bar (17) and a side member (18) extending laterally from the bar for supporting the chuck. |
