发明名称 |
PHOTOSENSITIVE COMPOSITION AND USE THEREOF |
摘要 |
A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.
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申请公布号 |
KR20050118272(A) |
申请公布日期 |
2005.12.16 |
申请号 |
KR20057015944 |
申请日期 |
2005.08.26 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
ZUANG HONG;OBERLANDER JOSEPH E.;LU PING HUNG;WANAT STANLEY F.;PLASS ROBERT R. |
分类号 |
G03F7/033;(IPC1-7):G03F7/027;G03F7/004 |
主分类号 |
G03F7/033 |
代理机构 |
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代理人 |
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地址 |
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