发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 A semiconductor device is provided with an SRAM cell unit provided with a pair of driving transistors, a pair of load transistors and a pair of access transistors. Each of the transistors is provided with a semiconductor layer protruding upward from a base flat plane, a gate electrode extending on opposing both side planes over the semiconductor layer from the upper part, a gate insulating film provided between the gate electrode and the semiconductor layer, and a pair of source/drain regions provided on the semiconductor layer. Each semiconductor layer is arranged by having its longitudinal direction in a first direction. In the adjacent SRAM cell units in the first direction, in each of the corresponding transistors, the semiconductor layer of one transistor is arranged on a center line in the first direction of the semiconductor layer of the other transistor.
申请公布号 WO2005119764(A1) 申请公布日期 2005.12.15
申请号 WO2005JP09796 申请日期 2005.05.27
申请人 NEC CORPORATION;TAKEDA, KOICHI;WAKABAYASHI, HITOSHI;TAKEUCHI, KIYOSHI;YAMAGAMI, SHIGEHARU;NOMURA, MASAHIRO;TANAKA, MASAYASU;TERASHIMA, KOICHI;KOH, RISHO;TANAKA, KATSUHIKO 发明人 TAKEDA, KOICHI;WAKABAYASHI, HITOSHI;TAKEUCHI, KIYOSHI;YAMAGAMI, SHIGEHARU;NOMURA, MASAHIRO;TANAKA, MASAYASU;TERASHIMA, KOICHI;KOH, RISHO;TANAKA, KATSUHIKO
分类号 H01L21/8244;H01L21/84;H01L21/86;H01L27/11;H01L27/12;H01L29/786 主分类号 H01L21/8244
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