| 摘要 |
Spin-coating apparatus for use in manufacturing a semiconductor device or the like and a method of operation of the apparatus prevent substrates from being positioned incorrectly in a process module of the apparatus. The spin-coating apparatus includes an image sensor that captures an image of the wafer in the process module, and a control unit that receives image data from the image sensor. The method includes loading a substrate onto a process module using an arm of a transfer device, capturing an image of the substrate using the image sensor, and comparing image data generated by the image sensor with a standard image data stored to determine an actual position of the substrate. If the substrate is incorrectly positioned, the operation of the arm of the transfer device is adjusted to compensate.
|
